1/ f Noise Characterization of Bilayer MoS 2 Field‐Effect Transistors on Paper with Inkjet‐Printed Contacts and hBN Dielectrics

نویسندگان

چکیده

1/f noise represents the dominant source of in low-frequency range several physical systems, including field-effect transistors. Its investigation can provide very important information on fabrication process, highlighting steps that are more prone to introduction defects. Here, bilayer MoS2 transistors paper with inkjet-printed Ag contacts and hBN dielectric is investigated. These devices promising building blocks for future low-cost, flexible, easily recyclable disposable electronics. The analysis noise, performed following Hooge's empirical approach, results a Hooge parameter ≈1–10, which comparable those reported SiO2. present indicate properties investigated stable against substrate bending mainly determined by printing dielectric, while not being sensibly affected use substrate. further development low 2D material-based flexible electronics paper.

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Low-frequency 1/f noise in MoS2 transistors: Relative contributions of the channel and contacts

Articles you may be interested in Characterization of metal contacts for two-dimensional MoS2 nanoflakes Appl. Low-frequency noise in amorphous indium-gallium-zinc oxide thin-film transistors from subthreshold to saturation Appl. Low-frequency noise in a thin active layer-Si:H thin-film transistors

متن کامل

Low-frequency noise in bilayer MoS(2) transistor.

Low-frequency noise is a significant limitation on the performance of nanoscale electronic devices. This limitation is especially important for devices based on two-dimensional (2D) materials such as graphene and transition metal dichalcogenides (TMDs), which have atomically thin bodies and, hence, are severely affected by surface contaminants. Here, we investigate the low-frequency noise of tr...

متن کامل

Shot noise behaviour of subthreshold MOS transistors

2014 It is shown that assuming weak inversion, low drain current asymptotic value of the gate equivalent noise resistor is given by n2/2 UT/ID, corresponding to shot noise. Measurements confirming this theory as well as flicker noise measurements on n and p channel transistors integrated with either bulk or SOS CMOS silicon gate technology are presented. REVUE DE PHYSIQUE APPLIQUÉE TOME 13, DÉC...

متن کامل

Study of flicker noise and RTN for characterization of gate dielectrics in MOS systems

Low frequency noise is getting increasing attention as dimensions scale down. Ths study of LFN is important because of its appearance as a fundamental limit for scaling, its impact on RF and analog applications but most importantly it can serve as a diagnostic tool for quality and reliability of MOSFETs. The interface between the dielectric and channel is not ideal. Further as newer materials a...

متن کامل

Detailed Analysis of FIBL in MOS Transistors with High-K Gate Dielectrics

This paper analyzes in detail the Fringing Induced Barrier Lowering (FIBL) in MOS transistors with high-K gate dielectrics using two-dimensional device simulations. We found that the device short channel performance is degraded with increase in gate dielectric permittivity(Kgate) due to an increase in the dielectric physical thickness to channel length ratio. For Kgate greater than Ksi, we obse...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Advanced electronic materials

سال: 2021

ISSN: ['2199-160X']

DOI: https://doi.org/10.1002/aelm.202100283